An array of 3x10(7) Ge self-assembled quantum dots is embedded into the act
ive channel of a Si metaloxide-field-effect transistor. Conductance oscilla
tions with a gate voltage resulting from a successive lending of holes into
the dots are observed. Based on measurements of the temperature dependence
of the conductance maxima, the charge-transfer mechanism in the channel is
identified as being due to variable-range hopping between the dots, with t
he typical hopping energy determined by interdot Coulomb interaction. The c
haracteristic spatial dimension of the hole wave functions as well as the c
harging energies of the dots are determined from the conductance data. The
effect of the proximity of a bulk conductor on hopping transport is studied
. We find that putting a metal plane close to the dot layer causes a crosso
ver from Efros-Shklovskii variable-range hopping conductance to two-dimensi
onal Mott behavior as the temperature is reduced. At the crossover temperat
ure the hopping activation energy is observed to fall off. The metal plane
is shown not to affect the conductance of samples which show Mott hopping.
In the Efros-Shklovskii hopping regime, the conductance prefactor was found
to be similar or equal to e(2)/h, and the conductance to scale with the te
mperature. In the fully screened limit, the universal behavior of the prefa
ctor is destroyed, and it begins to depend on the localization length. The
experimental results are explained by a screening of long-range Coulomb pot
entials, and provide evidence for strong electron-electron interaction betw
een dots in the absence of screening.