Nucleation and growth of diamond films on molybdenum

Citation
Wl. Wang et al., Nucleation and growth of diamond films on molybdenum, SURF COAT, 126(2-3), 2000, pp. 195-198
Citations number
11
Categorie Soggetti
Material Science & Engineering
Journal title
SURFACE & COATINGS TECHNOLOGY
ISSN journal
02578972 → ACNP
Volume
126
Issue
2-3
Year of publication
2000
Pages
195 - 198
Database
ISI
SICI code
0257-8972(20000424)126:2-3<195:NAGODF>2.0.ZU;2-O
Abstract
The nucleation and growth of diamond films on molybdenum were investigated by scanning electron microscopy and Raman spectroscopy. Diamond films were deposited by hot-filament chemical vapor deposition via electron emission-e nhanced nucleation, in which a de negative voltage relative to the filament was applied to a tungsten electrode that was previously coated with diamon d, by chemical vapor deposition. The electrode-to-substrate distance was on e of the deposition variables. The maximum value of the nucleation density was found to be up to 10(11) cm(-2) on a pristine Mo surface by electron em ission-enhanced nucleation. Electron emission-enhanced nucleation also grea tly improved the quality and adhesion of diamond films on a Mo substrate. ( C) 2000 Elsevier Science S.A. All rights reserved.