Rotational epitaxy of a 'soft' metal overlayer on Si(111)

Citation
L. Vitali et al., Rotational epitaxy of a 'soft' metal overlayer on Si(111), SURF SCI, 452(1-3), 2000, pp. L281-L286
Citations number
16
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
SURFACE SCIENCE
ISSN journal
00396028 → ACNP
Volume
452
Issue
1-3
Year of publication
2000
Pages
L281 - L286
Database
ISI
SICI code
0039-6028(20000501)452:1-3<L281:REOA'M>2.0.ZU;2-#
Abstract
The observation of rotational epitaxy of an incommensurate 'soft' T1 metal overlayer on a pseudomorphic Si(111)1 x 1-T1 surface by STM is reported. Th e structural 'softness' of this two-dimensional overlayer is destroyed by a dditional metal atom deposition, which induces condensation into three-dime nsional island structures as a result of the quenching of a strain relaxati on mechanism. It is suggested that the 'soft' T1 metal adlayer represents a metastage in the three-dimensional island formation process of Stranski-Kr astanov growth. It is interesting that this metastable second T1 layer coll apses on further growth and becomes incorporated into the three-dimensional islands once these have nucleated. (C) 2000 Published by Elsevier Science B.V. All rights reserved.