Impact of column bending in high-resolution transmission electron microscopy on the strain evaluation of GaAs/InAs/GaAs heterostructures

Citation
K. Tillmann et al., Impact of column bending in high-resolution transmission electron microscopy on the strain evaluation of GaAs/InAs/GaAs heterostructures, ULTRAMICROS, 83(1-2), 2000, pp. 111-128
Citations number
29
Categorie Soggetti
Multidisciplinary,"Spectroscopy /Instrumentation/Analytical Sciences
Journal title
ULTRAMICROSCOPY
ISSN journal
03043991 → ACNP
Volume
83
Issue
1-2
Year of publication
2000
Pages
111 - 128
Database
ISI
SICI code
0304-3991(200005)83:1-2<111:IOCBIH>2.0.ZU;2-4
Abstract
The accuracy of strain profiles obtained by a quantitative analysis of latt ice fringe spacings from high-resolution micrographs is discussed. Focusing on highly lattice mismatched GaAs/InAs/GaAs heterostructures the local str ain distribution of the layers is calculated by finite element simulations to determine the atom positions in elastically relaxed transmission electro n microscopy specimens. By analysing simulated images a significant decoupl ing between the layer structure and the contrast pattern motifs is found fo r relevant imaging conditions, which may result in an incorrect determinati on of strain profiles and layer compositions when examining experimental mi crographs. (C) 2000 Elsevier Science B.V. All rights reserved.