Local structure and bonding of Er in GaN: A contrast with Er in Si

Citation
Ph. Citrin et al., Local structure and bonding of Er in GaN: A contrast with Er in Si, APPL PHYS L, 76(20), 2000, pp. 2865-2867
Citations number
18
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
76
Issue
20
Year of publication
2000
Pages
2865 - 2867
Database
ISI
SICI code
0003-6951(20000515)76:20<2865:LSABOE>2.0.ZU;2-V
Abstract
X-ray absorption measurements from relatively high concentrations of Er (> 0.1 at. %) doped in GaN films show that Er occupies the Ga site with an unp recedentedly short Er-N bond length. Electroluminescence intensities from t hese GaN:Er films correlate with the concentration of Er atoms that replace Ga, not with the abundantly present O impurities in the host. Simple chemi cal concepts are used to explain each of these results and their striking d ifference from those obtained for Er-doped Si. (C) 2000 American Institute of Physics. [S0003-6951(00)03320-9].