High-Q HF microelectromechanical filters

Citation
Fd. Bannon et al., High-Q HF microelectromechanical filters, IEEE J SOLI, 35(4), 2000, pp. 512-526
Citations number
36
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
IEEE JOURNAL OF SOLID-STATE CIRCUITS
ISSN journal
00189200 → ACNP
Volume
35
Issue
4
Year of publication
2000
Pages
512 - 526
Database
ISI
SICI code
0018-9200(200004)35:4<512:HHMF>2.0.ZU;2-J
Abstract
IC-compatible microelectromechanical intermediate frequency filters using i ntegrated resonators with Q's in the thousands to achieve filter Q's in the hundreds have been demonstrated using a polysilicon surface micromachining technology: These filters are composed of two clamped-clamped beam microme chanical resonators coupled by a soft flexural-mode mechanical spring. The center frequency of a given filter is determined by the resonance frequency of the constituent resonators, while the bandwidth is determined by the co upling spring dimensions and its location between the resonators. Quarter-w avelength coupling is required on this microscale to alleviate mass loading effects caused by similar resonator and coupler dimensions. Despite constr aints arising from quarter-wavelength design, a range of percent bandwidths is still attainable by taking advantage of low-velocity spring attachment locations. A complete design procedure is presented in which electromechani cal analogies are used to model the mechanical device via equivalent electr ical circuits. Filter center frequencies around 8 MHz with Q's from 40 to 4 50 (i.e., percent bandwidths from 0.23 to 2.5%), associated insertion losse s less than 2 dB, and spurious-free dynamic ranges around 78 dB are demonst rated using low-velocity designs with input and output termination resistan ces on the order of 12 k Omega.