Epitaxial laterally overgrown GaN (ELOG) structures are microscopically cha
racterized using cathodoluminescence (CL), micro-Raman spectroscopy and tim
e-resolved micro-photoluminescence. Two ELOG samples consisting of a 3 mu m
thick GaN buffer layer on (0001) sapphire masked with SiO2 stripes paralle
l to [1100] an [1120] direction, respectively, were investigated. Beside th
eir technological relevance ELOG samples are a superior subject of investig
ations due to internal gradients in strain and free carrier concentration.
To study the influence of the different lateral growth mechanisms on the op
tical properties of the GaN in the coherently grown and in the overgrown re
gion, we correlate the temporal behavior of the near band gap luminescence
with the local free carrier concentration as determined by the peak positio
n of the coupled phonon plasmon modes (LPP). The spatial resolution of both
of the microscopic methods is about 1 mu m. As a result we observe distinc
t differences in the decay times of the near band gap luminescence for the
two different samples as well as for different regions within one sample. T
he observed behavior is explained by the fact that extrinsic or intrinsic d
efects give rise to shallow donor levels, causing a gradient in free carrie
r concentration. Therefore the near-band-gap emission changes from excitoni
c luminescence to band-to-band recombination depending on the distance from
the interface as evidenced by micro-photoluminescence. Beside these drasti
c changes we also observe a change in decay times in the region of excitoni
c emission correlated with the donor concentration which leads to a differe
nt influence of the coulomb screening effect. (C) 2000 Elsevier Science B.V
. All rights reserved.