The microstructure of continuously processed YBa2Cu3Oy coated conductors with underlying CeO2 and ion-beam-assisted yttria-stabilized zirconia bufferlayers

Citation
Tg. Holesinger et al., The microstructure of continuously processed YBa2Cu3Oy coated conductors with underlying CeO2 and ion-beam-assisted yttria-stabilized zirconia bufferlayers, J MATER RES, 15(5), 2000, pp. 1110-1119
Citations number
39
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF MATERIALS RESEARCH
ISSN journal
08842914 → ACNP
Volume
15
Issue
5
Year of publication
2000
Pages
1110 - 1119
Database
ISI
SICI code
0884-2914(200005)15:5<1110:TMOCPY>2.0.ZU;2-O
Abstract
The microstructural development of YBa2Cu3Oy (Y-123) coated conductors base d on the ion-beam-assisted deposition (IBAD) of yttria-stabilized zirconia (YSZ) to produce a biaxially textured template is presented. The architectu re of the conductors was Y-123/CeO2/IBAD YSZ/Inconel 625. A continuous and passivating Cr2O3 layer forms between the YSZ layer and the Inconel substra te. CeO2 and Y-123 are closely lattice-matched. and misfit strain is accomm odated at the YSZ/CeO2 interface. Localized reactions between the Y-123 fil m and the CeO2 buffer layer result in the formation of BaCeO3, YCuO2, and C uO. The positive volume change that occurs from the interfacial reaction ma y act as a kinetic barrier that limits the extent of the reaction. Excess c opper and yttrium generated by the interfacial reaction appear to diffuse a long grain boundaries and intercalate into Y-123 grains as single layers of the Y-247, Y-248, or Y-224 phases. The interfacial reactions do not preclu de the attainment of high critical currents (I-c) and current densities (J( c)) in these films nor do they affect to any appreciable extent the nucleat ion and alignment of the Y-123 film.