ArF and KrF laser-induced gas-phase photolysis of selenophene and tellurophene: Extrusion of Te and Se and intramolecular 1,3-H shift competing with beta-C-C cleavage in C4H4 residue

Authors
Citation
J. Pola et A. Ouchi, ArF and KrF laser-induced gas-phase photolysis of selenophene and tellurophene: Extrusion of Te and Se and intramolecular 1,3-H shift competing with beta-C-C cleavage in C4H4 residue, J ORG CHEM, 65(9), 2000, pp. 2759-2762
Citations number
30
Categorie Soggetti
Chemistry & Analysis","Organic Chemistry/Polymer Science
Journal title
JOURNAL OF ORGANIC CHEMISTRY
ISSN journal
00223263 → ACNP
Volume
65
Issue
9
Year of publication
2000
Pages
2759 - 2762
Database
ISI
SICI code
0022-3263(20000505)65:9<2759:AAKLGP>2.0.ZU;2-C
Abstract
ArF (193 nm) and KrF (248 nm) laser-induced photolysis of gaseous selenophe ne and tellurophene (C4H4M, M = Se and Te) has been examined. It is shown t hat, unlike thiophene and furan, selenophene and tellurophene cleave both M -C bonds and yield the elemental heteroatom (Se, Te), 1-buten-3-yne, and et hyne. The proposed mechanism involves an intermediate . HC=CH-CH= CH . dira dical that decomposes via two competitive pathways, namely, 1,3-H shift to 1-buten-3-yne and P-cleavage to two molecules of ethyne. It is shown that t he relative importance of the channels depends both on the energy of the ph oton and on the heteroatom Specifically, the 1,3-H shiftJPcleavage ratios a re 2.3 (193 nm, M = Se), 3.6 (248 nm, M = Se), 1.4 (193 nm, M = Te), and 10 .5 (248 nm, M = Te). The inertness of the Te residuum and the high preferen ce for the 1,3-H shift in KrF laser photolysis of tellurophene suggest that this photolysis can serve as a source of the C4H4 diradical for mechanisti c studies.