Dielectric relaxation time measurement in absorbing photorefractive materials

Citation
I. De Oliveira et J. Frejlich, Dielectric relaxation time measurement in absorbing photorefractive materials, OPT COMMUN, 178(1-3), 2000, pp. 251-255
Citations number
25
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Optics & Acoustics
Journal title
OPTICS COMMUNICATIONS
ISSN journal
00304018 → ACNP
Volume
178
Issue
1-3
Year of publication
2000
Pages
251 - 255
Database
ISI
SICI code
0030-4018(20000501)178:1-3<251:DRTMIA>2.0.ZU;2-R
Abstract
We show that absorbing photorefractive materials characterized by a space-c harge exponential relaxation time law exhibit an overall hologram optical e rasure that is described by the so-called exponential integral function, as far as self-diffraction can be neglected. This fact is due to the bulk abs orption producing an exponentially decreasing distribution of the erasure b eam irradiance along the sample thickness that results in a correspondingly increasing dielectric relaxation time. The theoretical development in this paper is experimentally verified by the analysis of the holographic erasur e in a nominally undoped Bi12TiO20 photorefractive crystal using the 514.5 nm laser wavelength where this material exhibits a relatively strong bulk a bsorption. Neglecting absorption in this experiment leads to a relaxation t ime that is about 4-fold larger than the actual value. (C) 2000 Published b y Elsevier Science B.V. All rights reserved.