Multimillion atom simulations of nanostructured materials on parallel computers - Sintering and consolidation, fracture, and oxidation

Citation
P. Vashishta et al., Multimillion atom simulations of nanostructured materials on parallel computers - Sintering and consolidation, fracture, and oxidation, PROG T PH S, (138), 2000, pp. 175-190
Citations number
29
Categorie Soggetti
Physics
Journal title
PROGRESS OF THEORETICAL PHYSICS SUPPLEMENT
ISSN journal
03759687 → ACNP
Issue
138
Year of publication
2000
Pages
175 - 190
Database
ISI
SICI code
0375-9687(2000):138<175:MASONM>2.0.ZU;2-F
Abstract
Multiresolution molecular-dynamics approach for multimillion atom simulatio ns has been used to investigate structural properties, mechanical failure i n ceramic materials, and atomic-level stresses in nanoscale semiconductor/c eramic mesas (Si/Si3N4) Crack propagation and fracture in silicon nitride, silicon carbide, gallium arsenide, and nanophase ceramics are investigated. We observe a crossover from slow to rapid fracture and a correlation betwe en the speed of crack propagation and morphology of fracture surface. A 100 million atom simulation is carried out to study crack propagation in GaAs. Mechanical failure in the Si/Si3N4 interface is studied by applying tensil e strain parallel to the interface. Ten million atom molecular dynamics sim ulations are performed to determine atomic-level stress distribtions in a 5 4 nm nanopixel on a 0.1 mu m silicon substrate. Multimillion atom simulatio ns of oxidation of aluminum nanoclusters and nanoindentation in silicon nit ride are also discussed.