P. Vashishta et al., Multimillion atom simulations of nanostructured materials on parallel computers - Sintering and consolidation, fracture, and oxidation, PROG T PH S, (138), 2000, pp. 175-190
Multiresolution molecular-dynamics approach for multimillion atom simulatio
ns has been used to investigate structural properties, mechanical failure i
n ceramic materials, and atomic-level stresses in nanoscale semiconductor/c
eramic mesas (Si/Si3N4) Crack propagation and fracture in silicon nitride,
silicon carbide, gallium arsenide, and nanophase ceramics are investigated.
We observe a crossover from slow to rapid fracture and a correlation betwe
en the speed of crack propagation and morphology of fracture surface. A 100
million atom simulation is carried out to study crack propagation in GaAs.
Mechanical failure in the Si/Si3N4 interface is studied by applying tensil
e strain parallel to the interface. Ten million atom molecular dynamics sim
ulations are performed to determine atomic-level stress distribtions in a 5
4 nm nanopixel on a 0.1 mu m silicon substrate. Multimillion atom simulatio
ns of oxidation of aluminum nanoclusters and nanoindentation in silicon nit
ride are also discussed.