In plasma-emitting structures based on glow-discharge, the potential differ
ence between the ion-emitting plasma and the screening electrode of an ion-
optic system depends on particular features of the electrode system of glow
discharge and can vary in a range 0-1 kV. Results are presented of an expe
rimental study and computer simulation of the formation of ion beams with i
on energy 0-1 keV and current density 1-10 mA/cm(2) in ion sources based on
such structures. (C) 2000 MAIK "Nauka/Interperiodica".