A computerized complex for recording and processing of reflected high-energy electron diffraction patterns

An efficient and high-speed complex for visualization, reading, and process ing of reflected high-energy electron diffraction patterns is described. Th e block diagrams and technical data of the complex, as well as its interfac e with devices controlling molecular-beam epitaxy of semiconductor structur es, are presented. Dedicated software for processing high-energy electron d iffraction patterns, including in real time, is suggested. The complex was used for studying heteroepitaxial growth and the formation of InAs nanostru ctures on the GaAs and Si surfaces. (C) 2000 MAIK "Nauka/Interperiodica".