Ferrite and high-temperature superconductor targets for sputtering

A method is described of preparing targets for sputtering, which involves t he use of plasma deposition of respective powders onto a cooled metal plate . It is demonstrated that the use of plasma technology enables one to produ ce, in a controlled atmosphere, intricately shaped ceramic targets characte rized by a highly uniform composition and by reliable mechanical and therma l contact of the resultant coating with the holder plate. Experiments are p erformed on the sputtering of targets to prepare polycrystalline ferrite fi lms for magnetooptical applications and epitaxial films of high-temperature superconductors. (C) 2000 MAIK "Nauka/Interperiodica".