Trapping levels in nanocrystalline porous silicon

Citation
Ml. Ciurea et al., Trapping levels in nanocrystalline porous silicon, APPL PHYS L, 76(21), 2000, pp. 3067-3069
Citations number
15
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
76
Issue
21
Year of publication
2000
Pages
3067 - 3069
Database
ISI
SICI code
0003-6951(20000522)76:21<3067:TLINPS>2.0.ZU;2-2
Abstract
Trapping levels in fresh (one month) and naturally aged (one year) nanocrys talline porous silicon have been investigated using the optical charging sp ectroscopy method. Four significant maxima and/or shoulders were observed f or fresh samples and five for aged ones. They have been attributed to five and six trapping levels, respectively. The trapping centers corresponding t o the most shallow four levels are situated at or nearby the internal surfa ce of the porous silicon films. (C) 2000 American Institute of Physics. [S0 003-6951(00)01621-1].