S. Cristoloveanu et al., A review of the pseudo-MOS transistor in SOI wafers: Operation, parameter extraction, and applications, IEEE DEVICE, 47(5), 2000, pp. 1018-1027
The pseudo-MOS transistor (Psi-MOSFET) is a surprising and useful technique
for the rapid evaluation of SOI wafers, prior to any CMOS processing. We r
eview the static and dynamic modes of operation as well as the main models
and methods for electrical parameter extraction. Selected numerical simulat
ions are presented in order to clarify the optimal conditions of operation.
Finally, practical applications are exemplified which illustrate the effic
iency of the Psi-MOSFET technique for in situ characterization of SOI techn
ologies and processes.