A review of the pseudo-MOS transistor in SOI wafers: Operation, parameter extraction, and applications

Citation
S. Cristoloveanu et al., A review of the pseudo-MOS transistor in SOI wafers: Operation, parameter extraction, and applications, IEEE DEVICE, 47(5), 2000, pp. 1018-1027
Citations number
26
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
IEEE TRANSACTIONS ON ELECTRON DEVICES
ISSN journal
00189383 → ACNP
Volume
47
Issue
5
Year of publication
2000
Pages
1018 - 1027
Database
ISI
SICI code
0018-9383(200005)47:5<1018:AROTPT>2.0.ZU;2-8
Abstract
The pseudo-MOS transistor (Psi-MOSFET) is a surprising and useful technique for the rapid evaluation of SOI wafers, prior to any CMOS processing. We r eview the static and dynamic modes of operation as well as the main models and methods for electrical parameter extraction. Selected numerical simulat ions are presented in order to clarify the optimal conditions of operation. Finally, practical applications are exemplified which illustrate the effic iency of the Psi-MOSFET technique for in situ characterization of SOI techn ologies and processes.