Origin of asymmetric growth during solid-state amorphization studied with molecular-dynamics simulation

Citation
Q. Zhang et al., Origin of asymmetric growth during solid-state amorphization studied with molecular-dynamics simulation, J APPL PHYS, 87(11), 2000, pp. 7696-7701
Citations number
18
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF APPLIED PHYSICS
ISSN journal
00218979 → ACNP
Volume
87
Issue
11
Year of publication
2000
Pages
7696 - 7701
Database
ISI
SICI code
0021-8979(20000601)87:11<7696:OOAGDS>2.0.ZU;2-X
Abstract
Solid-state interfacial reaction in the Ni/Nb multilayers upon thermal anne aling is investigated with molecular-dynamics simulation. The result shows that amorphization takes place at medium temperatures and the growth of the amorphous interlayer presents an asymmetric behavior due to faster consumi ng of the Ni layer than the Nb layer. Consequently, a Ni-enriched amorphous phase is formed together with some unreacted Nb before complete amorphizat ion, which agrees well with the experimental observations. Moreover, it is revealed that the Nb lattice can accommodate a large number of Ni atoms and still retain crystalline structure, while a small amount of Nb atoms induc e a spontaneous decay of the Ni lattice, which is essentially the physical origin of the asymmetric growth observed in not only the Ni-Nb system but a lso in the other systems studied so far. (C) 2000 American Institute of Phy sics. [S0021-8979(00)04311-5].