Simultaneous STM and UHV electron microscope observation of silicon nanowires extracted from Si(111) surface

Citation
Y. Naitoh et al., Simultaneous STM and UHV electron microscope observation of silicon nanowires extracted from Si(111) surface, J ELEC MICR, 49(2), 2000, pp. 211-216
Citations number
23
Categorie Soggetti
Multidisciplinary
Journal title
JOURNAL OF ELECTRON MICROSCOPY
ISSN journal
00220744 → ACNP
Volume
49
Issue
2
Year of publication
2000
Pages
211 - 216
Database
ISI
SICI code
0022-0744(2000)49:2<211:SSAUEM>2.0.ZU;2-7
Abstract
A miniaturized scanning tunnelling microscope (STM) was fitted in a side-en try holder of an ultra-high vacuum electron microscope. The clean Si(111)7 X 7 surface was observed by both STM and reflection electron microscopy (RE M) at. atomic resolution. The tungsten rips were often rounded off upon tip -approach with a constant current, through a gentle touch with the sample s urface. The apices of such rounded tips had radii of several tens of granom etre with widths of about 3 x 3 nm. Atomically resolved STM of the Si(111)7 X 7 surface was obtainable when an atom or an atomic cluster sits on the t ip surface. The rounded lips were used for fabrication of Si nanowires by t he touch-and-away operation of the tip. The nanowires grew longer at higher substrate temperature and they reached as long as several tens of nanometr e at 700 degrees C. The nanowire had many twins and the (111) twin lamellae were stacked in the direction of the wire axis. In another case, the twin planes were oblique to the wire axis so that the < 112 > direction was near ly parallel to the wire axis.