A study of ferroelectric thin films deposited on a LaNiO3 barrier electrode by nebulized spray pyrolysis

Citation
P. Murugavel et al., A study of ferroelectric thin films deposited on a LaNiO3 barrier electrode by nebulized spray pyrolysis, J PHYS D, 33(8), 2000, pp. 906-911
Citations number
18
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF PHYSICS D-APPLIED PHYSICS
ISSN journal
00223727 → ACNP
Volume
33
Issue
8
Year of publication
2000
Pages
906 - 911
Database
ISI
SICI code
0022-3727(20000421)33:8<906:ASOFTF>2.0.ZU;2-X
Abstract
Thin films of ferroelectric PbTiO3 (PT) and Pb(Zr0.5Ti0.5)O-3 (PZT) as well as antiferroelectric PbZrO3 (PZ) have been prepared on LaNiO3/SiO2/Si subs trates by nebulized spray pyrolysis (NSP) of metal-organic precursors. The metallic LaNiO3 (LNO) electrode layer was also deposited by NSP. The ferroe lectric films obtained show satisfactory morphology and desirable dielectri c properties. Typical values of the coercive field, remnant polarization an d dielectric constant (300 K) for the PT/lNO/SiO2/Si film are 170 kV cm(-1) , 22 mu C cm(-2) and 210, respectively, with the corresponding values for t he PZT/LNO/SiO2/Si film being 120 kV cm(-1), 13 mu C cm(-2) and 540, respec tively. The PZ/LNO/SiO2/Si film shows typical antiferroelectric characteris tics including the electric-field induced reversible antiferroelectric-ferr oelectric transition. The various films deposited on LNO/SiO2/Si by NSP are comparable in all respects to those prepared on Pt/Ti/SiO2/Si by the same technique.