Diagnostics by optical absorption of sputtered atom density in magnetron discharges

Densities of sputtered atoms in Ar rf magnetron discharges have been measur ed by optical absorption. The resonant and self-absorption methods have bee n used. The first one has given Al and Mg atom densities with an uncertaint y of 40% and the second one the order of magnitude of Si atom densities. Th e Al atom densities are strongly decreasing from 93.7% Al alloy target: (1- 5) x 10(11) cm(-3)-10.3% Al aluminosilicate glass: (1-2) x 10(9) cm(-3). Th e Si atom density is in the range (3-9) x 10(10) cm(-3) in the aluminosilic ate glasses. The Al and Si sputtered atom densities follow the sputtering y ields of Al metal and Al, Si oxide targets. (C) 2000 American Vacuum Societ y. [S0734-2101(00)00503-0].