Real time scanning tunneling microscopy study of the initial stages of oxidation of Ni(111) between 400 and 470 K

Citation
S. Hildebrandt et al., Real time scanning tunneling microscopy study of the initial stages of oxidation of Ni(111) between 400 and 470 K, J VAC SCI A, 18(3), 2000, pp. 1010-1015
Citations number
24
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
ISSN journal
07342101 → ACNP
Volume
18
Issue
3
Year of publication
2000
Pages
1010 - 1015
Database
ISI
SICI code
0734-2101(200005/06)18:3<1010:RTSTMS>2.0.ZU;2-T
Abstract
A real-time in situ study of the initial stages of the interaction of oxyge n with Ni(111) in a high temperature scanning tunneling microscope (STM) at temperatures between 400 and 470 K is presented. Oxygen adsorption feature s, in particular the Ni(111)-p(2X2)O reconstruction, were identified in roo m temperature STM images. The process of oxide formation is investigated in detail at 470 K. Starting from the initial nucleation at the step edges, a gradual transformation of the terrace structure results in the formation o f a three-domain NiO(001) layer finally covering: the entire terraces as we ll as forming bulges at the steps due to surface diffusion of excess Ni. We ll-resolved local oxide surface structures are discussed on the basis of a thin (001)-oriented NiO layer model on the Ni(111) substrate. Formation of triangular bulk NiO(111) islands is observed for higher oxygen exposures ab ove 25 L. (C) 2000 American Vacuum Society. [S0734-2101(00)00203-7].