Effect of sulphur content and pre-annealing treatments on nickel grain-boundary diffusion in high-purity copper

Citation
Z. Tokei et al., Effect of sulphur content and pre-annealing treatments on nickel grain-boundary diffusion in high-purity copper, PHIL MAG A, 80(5), 2000, pp. 1075-1083
Citations number
21
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
PHILOSOPHICAL MAGAZINE A-PHYSICS OF CONDENSED MATTER STRUCTURE DEFECTS ANDMECHANICAL PROPERTIES
ISSN journal
13642804 → ACNP
Volume
80
Issue
5
Year of publication
2000
Pages
1075 - 1083
Database
ISI
SICI code
1364-2804(200005)80:5<1075:EOSCAP>2.0.ZU;2-K
Abstract
Anger electron spectroscopy (AES) and radiotracers were used to study the e ffects of pre-annealing treatments and grain boundary migration on nickel g rain-boundary diffusion in pure 5N copper at 718 K in the B-kinetic regime. The diffusion penetration profiles are complex, which can be interpreted b y the copresence of stationary and moving grain boundaries. Attempts to emp hasize the grain-boundary migration effect were made by the application of different pre-annealing treatments before diffusion. It was shown by AES th at this preparation procedure induces a modification in the bulk sulphur co ntent which is a residual impurity in 5N copper. It is shown that a few ppm of sulphur dissolved in the bulk has a pronounced influence on the data; t he higher the sulphur content, the lower the triple-product and the grain-b oundary migration velocity.