Instability-driven SiGe island growth

Citation
Rm. Tromp et al., Instability-driven SiGe island growth, PHYS REV L, 84(20), 2000, pp. 4641-4644
Citations number
19
Categorie Soggetti
Physics
Journal title
PHYSICAL REVIEW LETTERS
ISSN journal
00319007 → ACNP
Volume
84
Issue
20
Year of publication
2000
Pages
4641 - 4644
Database
ISI
SICI code
0031-9007(20000515)84:20<4641:ISIG>2.0.ZU;2-K
Abstract
Three-dimensional islanding is generally assumed to proceed through nucleat ion and growth. Here we present studies showing the growth of Si1-xGex isla nds (0.2 < x < 0.6) without nucleation. Rather, a strain-driven growth inst ability induces a network of elevated cells, where the angle of elevation s elf-limits when {105} facets form pyramidal islands. These strain-modulated surfaces may serve as a template for the spatially controlled growth of qu antum dot ensembles.