We have determined the structure of AlSb and GaSb (001) surfaces prepared b
y molecular beam epitaxy under typical Sb-rich device growth conditions. Wi
thin the range of flux and temperature where the diffraction pattern is nom
inally (1 x 3), we find that there are actually three distinct, stable (4 x
3) surface reconstructions. The three structures differ from any previousl
y proposed for these growth conditions, with two of the reconstructions inc
orporating mixed III-V dimers within the Sb surface layer. These heterodime
rs appear to play an important role in island nucleation and growth.