Reliable contacts to two-dimensional conduction layers

Citation
V. Souw et al., Reliable contacts to two-dimensional conduction layers, APPL PHYS L, 76(22), 2000, pp. 3307-3309
Citations number
21
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
76
Issue
22
Year of publication
2000
Pages
3307 - 3309
Database
ISI
SICI code
0003-6951(20000529)76:22<3307:RCTTCL>2.0.ZU;2-R
Abstract
For many experiments and device applications, electrical contacts to a two- dimensional conduction layer must remain reliable under repeated temperatur e cycling between 300 and 77 K or lower. This work introduces the use of a silicon-doped InAs contact to the AlGaAs/GaAs two-dimensional electron gas which demonstrates exceptional reliability under such temperature cycling. The noise spectrum of AlGaAs/GaAs contacted with silicon-doped InAs shows a lmost no dependence on bias current; this fact can be used to improve the p erformance of device applications such as Hall sensors. In addition, this w ork introduces an alternative two-dimensional conduction structure, highly mismatched InAs/GaP. InAs/GaP contacted with Ti/Au shows reliability equal to AlGaAs/GaAs contacted with silicon-doped InAs. The InAs/GaP material may be more desirable for some applications because of the lower temperature d ependence of its electronic properties and potentially easier integration w ith silicon-based microelectronics. (C) 2000 American Institute of Physics. [S0003-6951(00)04822-1].