IR laser-induced decomposition of 1,3-dimethyldisiloxane for chemical vapour deposition of nano-structured methyl(hydrido)silicone phases

Authors
Pola, J Urbanova, M Bastl, Z Subrt, J Papagiannakopoulos, P
Citation
J. Pola et al., IR laser-induced decomposition of 1,3-dimethyldisiloxane for chemical vapour deposition of nano-structured methyl(hydrido)silicone phases, J MAT CHEM, 10(6), 2000, pp. 1415-1418
Citations number
30
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF MATERIALS CHEMISTRY
ISSN journal
09599428 → ACNP
Volume
10
Issue
6
Year of publication
2000
Pages
1415 - 1418
Database
ISI
SICI code
0959-9428(2000)10:6<1415:ILDO1F>2.0.ZU;2-R
Abstract
The infrared multiphoton decomposition of 1,3-dimethyldisiloxane induced by a TEA CO2 laser yields gaseous C-1-C-2 hydrocarbons, methylsilane, dimethy lsilane, methyldisiloxane and trimethyldisiloxane. These products provide e vidence for a range of decomposition steps; amongst these, cleavage of the Si-O bond is important. The process affords chemical vapour deposition of a white solid nano-structured methyl(hydrido)silicone phase that has been ch aracterized by infrared and photoelectron spectroscopy and electron microsc opy.