In our computer simulation the preparation process was similar to the atom-
by-atom deposition onto a substrate which is a standard procedure to prepar
e amorphous semicondutors. For the calculation of the interactions between
carbon and silicon atoms, tight-binding potentials wen used. The Newton equ
ations of motion were solved by the Verlet algorithm. (C) 2000 Elsevier Sci
ence B.V. All rights reserved.