Growth of amorphous semiconductors: tight-binding molecular dynamics study

Citation
K. Kohary et S. Kugler, Growth of amorphous semiconductors: tight-binding molecular dynamics study, J NON-CRYST, 266, 2000, pp. 746-749
Citations number
23
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF NON-CRYSTALLINE SOLIDS
ISSN journal
00223093 → ACNP
Volume
266
Year of publication
2000
Part
B
Pages
746 - 749
Database
ISI
SICI code
0022-3093(200005)266:<746:GOASTM>2.0.ZU;2-0
Abstract
In our computer simulation the preparation process was similar to the atom- by-atom deposition onto a substrate which is a standard procedure to prepar e amorphous semicondutors. For the calculation of the interactions between carbon and silicon atoms, tight-binding potentials wen used. The Newton equ ations of motion were solved by the Verlet algorithm. (C) 2000 Elsevier Sci ence B.V. All rights reserved.