Effect of thermal annealing on dynamics of photoluminescence in a-GeSe2 films

Citation
Y. Wang et al., Effect of thermal annealing on dynamics of photoluminescence in a-GeSe2 films, J NON-CRYST, 266, 2000, pp. 904-907
Citations number
7
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF NON-CRYSTALLINE SOLIDS
ISSN journal
00223093 → ACNP
Volume
266
Year of publication
2000
Part
B
Pages
904 - 907
Database
ISI
SICI code
0022-3093(200005)266:<904:EOTAOD>2.0.ZU;2-7
Abstract
We have investigated the effect of thermal annealing on dynamics of photolu minescence (PL) in vacuum-evaporated a-GeSe2 films with thickness of 15 mu m. The intensity of PL increases over 200 times after annealing at 250 degr ees C, which makes it possible to take a first investigation on both decay time and fatigue effect. The disordered amorphous structure of the a-GeSe2 film, containing wrong bonds, Ge-Ge and Se-Se, has been reconstructed to a stable structure by diminishing the number of the wrong bonds and the relat ed strain or internal pressure by thermal annealing. (C) 2000 Elsevier Scie nce B.V. All rights reserved.