Application of As40S60-xSex layers for high-efficiency grating production

Here we investigate image formation properties of As40S60-xSex layers and t heir application for gratings fabrication. The light sensitivity of layers, the dissolution kinetics of as-evaporated and exposed layers in amine-base d etching solutions have been studied, The surface relief formation was inv estigated by means of numerical simulation and experimental investigations. The aim was to optimize treatment conditions to increase the efficiency of gratings. Transmission gratings with line periodicity 6-12 mu m were prepa red by exposure to a halogen-lamp through Cr masks and subsequent etching a chieved diffraction efficiencies from 20% to 26%, The recording of holograp hic gratings was carried out by exposure with Ar or He-Ne laser, Diffractio n efficiencies of reflection gratings with spatial frequencies 1800-2400 mm (-1) in polarized light were 80-90%. Polymer copies were obtained using the master gratings on the base of As-S-Se layers, (C) 2000 Elsevier Science B .V. All rights reserved.