The possibilities of using photodoped chalcogenide layers evaporated on sta
ndard Si/SiO2/Si3N4 substrates as Cu ion sensitive membranes for ion select
ive field-effect transistors (ISFETs) are investigated. The optimal concent
rations of the doped metals (Cu, Ag) are determined providing linearity of
some properties at concentrations 10(-1)-10(-6) M. The membrane samples sho
w a selectivity in the presence of Na, less in the presence of Fe, Zn, Pb,
Cr and lack of selectivity to Ag. The depth distribution of Cu and Ag in ch
alcogenide layer is measured by atomic electron spectroscopy. The effect of
the depth profiles of the dopants on the electrochemical properties of the
Si/SiO2/Si3N4/Cr/CuxAgy(As2S3)(100-(x+y)) membranes are measured. The resu
lts obtained indicate that ISFETs are possible. (C) 2000 Elsevier Science B
.V. All rights reserved.