Isotopic effect between hydrogen and deuterium emission in silicon

Citation
R. Biswas et al., Isotopic effect between hydrogen and deuterium emission in silicon, J NON-CRYST, 266, 2000, pp. 176-179
Citations number
19
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF NON-CRYSTALLINE SOLIDS
ISSN journal
00223093 → ACNP
Volume
266
Year of publication
2000
Part
A
Pages
176 - 179
Database
ISI
SICI code
0022-3093(200005)266:<176:IEBHAD>2.0.ZU;2-T
Abstract
We find an isotope effect between the breaking of SiH and SiD bands, using tight-binding molecular dynamics simulations. The vibrationally excited Si- D bending modes decay much more rapidly than Si-H bending modes, due to the coupling of SID modes with the interior silicon-phonon modes. The SiD bond is much more stable than the SiH bond. This stability explains the reduced degradation in deuterated metal-oxide-semiconductor (MOS) devices. For ger manium, the GeD and GeH bonds have little difference in their stabilities s ince their vibrational frequencies are greater than the interior Ge-spectru m, consistent with this vibrational coupling model. (C) 2000 Elsevier Scien ce B.V. All rights reserved.