Conductance fluctuations in undoped intrinsic hydrogenated amorphous silicon films prepared using several deposition techniques

Citation
M. Gunes et al., Conductance fluctuations in undoped intrinsic hydrogenated amorphous silicon films prepared using several deposition techniques, J NON-CRYST, 266, 2000, pp. 304-308
Citations number
19
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF NON-CRYSTALLINE SOLIDS
ISSN journal
00223093 → ACNP
Volume
266
Year of publication
2000
Part
A
Pages
304 - 308
Database
ISI
SICI code
0022-3093(200005)266:<304:CFIUIH>2.0.ZU;2-O
Abstract
Coplanar conductance fluctuations in a range of device quality undoped hydr ogenated amorphous silicon (a-Si:H) films prepared using different depositi on systems were measured in the temperature range of 440-505 It for frequen cies from 2 Hz to 3 kHz. The 1/f(x) type noise spectra had two different po wer law dependencies, one at lower frequencies with slope alpha(1) dose to unity and a second region at higher frequencies with slope alpha(2) around 0.60. The noise power density decreases with increasing temperature in the high frequency region, but only increases much less with temperature at low frequencies. The results indicate that the noise in undoyed intrinsic a-Si :H films is due to two independent noise mechanisms operating simultaneousl y. (C) 2000 Elsevier Science B.V. All rights reserved.