Electronic transport in hydrogenated microcrystalline silicon: similarities with amorphous silicon

Citation
C. Droz et al., Electronic transport in hydrogenated microcrystalline silicon: similarities with amorphous silicon, J NON-CRYST, 266, 2000, pp. 319-324
Citations number
14
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF NON-CRYSTALLINE SOLIDS
ISSN journal
00223093 → ACNP
Volume
266
Year of publication
2000
Part
A
Pages
319 - 324
Database
ISI
SICI code
0022-3093(200005)266:<319:ETIHMS>2.0.ZU;2-B
Abstract
Undoped hydrogenated microcrystalline silicon (mu c-Si:H) layers were grown by the very high frequency glow discharge (VHF-GD) technique under various deposition conditions. The electronic transport properties under illuminat ion were investigated by means of steady-state photoconductivity and steady -state photocarrier grating methods. Similarly to hydrogenated amorphous si licon (a-Si:H), power law dependencies as a function of the generation rate are observed for the photoconductivity, for the ambipolar diffusion length , and for the parameter b (indicating the Fermi level). For mu c-Si:H, as f or a-Si:H, nearly constant product of (mobility x recombination time) of ma jority and minority carriers is observed as a function of the parameter b. Based on these similarities, we assume that the electronic transport model developed for a-Si:H remains valid for mu c-Si:H. (C) 2000 Elsevier Science B.V. All rights reserved.