A thin interlayer of an early transition metal, e.g. titanium, can enhance
the bonding at a metal-ceramic interface considerably. The role of the elec
tronic structure in this phenomenon (the 'titanium effect') is studied quan
titatively by means of density functional calculations, employing norm-cons
erving ab initio pseudopotentials and a mixed basis of localized functions
and plane waves. The weakly bonding model interface Ag(100)/MgAl2O4(100) is
chosen, in order to minimize the lattice mismatch and to concentrate on el
ectronic interactions. The stepwise addition of Ti atoms at the interface f
rom zero to one monolayer of Ti leads to a pronounced enhancement of the bo
nding strength (Ag/Ti/MgAl2O4), From a comparison to the more strongly bond
ing systems Ag/Al/MgAl2O4 with a monatomic Al interlayer and Al/MgAl2O4 it
is concluded that this enhancement correlates with the reduction of the ele
ctron density in the interface layer. It is proposed that the interlayer ac
commodates Pauli repulsion between O anions and electron-rich Ag atoms by s
uitable electron redistribution, which is accompanied by pronounced energy
band shifts.