To improve thermoelectric properties, we attempt to dope Ti into SiC-based
composite by transient plastic phase process (TPPP) method. The final resul
t is composed of the functional phase SiC and the reinforcement phases TiCx
and TiSi2. The process of doping is the diffusion of Ti in TICx solid-solu
tion into SiC grain at high temperature. When the initial SiC is alpha-type
of 5 mu m size, the Seebeck coefficient S is less than 10 mu V/K at room t
emperature. SEM photograph shows the reason being that doping is very weak.
We change the initial SiC to the beta-type of 90 nm size to aid doping. It
is observed that S can be significantly improved to 46.3 mu V/K at room te
mperature. When the temperature rises, the improvement is even greater. Mea
surements of the lattice parameter of beta-SiC show that the parameter para
llel to the Si-C layer is almost unchanged and the parameter perpendicular
to the Si-C layer increases by about 0.48%, which demonstrated that Ti has
been successfully doped into the SiC grain and exists as interstitial impur
ities.