Synthesis and TEM study of nanoparticles and nanocrystalline thin films ofsilver by high pressure sputtering

Citation
R. Chandra et al., Synthesis and TEM study of nanoparticles and nanocrystalline thin films ofsilver by high pressure sputtering, NANOSTR MAT, 11(8), 1999, pp. 1171-1179
Citations number
10
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
NANOSTRUCTURED MATERIALS
ISSN journal
09659773 → ACNP
Volume
11
Issue
8
Year of publication
1999
Pages
1171 - 1179
Database
ISI
SICI code
0965-9773(199911)11:8<1171:SATSON>2.0.ZU;2-M
Abstract
High pressure magnetron sputtering is a very promising technique for the co ntrolled synthesis of nanocrystalline thin films as well as nanoparticles o f various systems. Here we discuss the conditions necessary for the synthes is of nanocrystalline silver both in the thin film and powder forms. The fo rmation of the nanophase material occurs in a relatively high pressure of i nert gas and at low substrate temperatures (77-300 K). The mean crystallogr aphic domain size of the nanocrystalline silver thus synthesized was found to lie in the 3-60 nm range. The growth pattern and morphology of the sputt er-deposited nano-grains were studied in detail using transmission electron microscopy and atomic force microscopy. (C) 2000 Acta Metallurgica Inc.