Structural stability of titania thin films

Citation
Pi. Gouma et al., Structural stability of titania thin films, NANOSTR MAT, 11(8), 1999, pp. 1231-1237
Citations number
22
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
NANOSTRUCTURED MATERIALS
ISSN journal
09659773 → ACNP
Volume
11
Issue
8
Year of publication
1999
Pages
1231 - 1237
Database
ISI
SICI code
0965-9773(199911)11:8<1231:SSOTTF>2.0.ZU;2-0
Abstract
This paper studies the stability of thin firms of nanostructured titania at elevated temperatures. Thin films of titania are intended for use in many applications, including high-temperature gas sensing devices. The initial s tructure of the films consists of nanocrystalline anatase (similar to 8nm). Exposure of the films to temperatures > 400 degrees C results in the nucle ation and subsequent rapid growth of rutile grains (final grain size > 300n m). In-situ, hot-stage experiments in the TEM were carried out, which revea led details about the nucleation and abnormal grain growth processes in thi s system. It is argued that coarsening of the nano-structure following the transformation is a characteristic of polymorphic reactions from metastable to stable phases. The nucleation process is a critical rate-controlling pr ocess for maintaining nanosize grains in the transformed material. (C) 2000 Acta Metallurgica Inc.