Improved electrodeposition process for the preparation of superconducting thallium oxide films

Citation
Rn. Bhattacharya et al., Improved electrodeposition process for the preparation of superconducting thallium oxide films, PHYSICA C, 333(1-2), 2000, pp. 59-64
Citations number
5
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
PHYSICA C
ISSN journal
09214534 → ACNP
Volume
333
Issue
1-2
Year of publication
2000
Pages
59 - 64
Database
ISI
SICI code
0921-4534(20000510)333:1-2<59:IEPFTP>2.0.ZU;2-R
Abstract
We report on developing a two-layer process to deposit biaxially textured T l-oxide films by electrodeposition (ED) on Ag-coated, single-crystal substr ates. Pole-figure measurements of two-layer, electrodeposited (Tl,Bi)-(Sr,B a)-Ca-Cu-O (TBSBCCO) films on 300 Angstrom Ag/LaAlO3 (LAO), with thickness between 1 and 5 mu m, clearly show strong biaxial texturing. The omega scan and phi scan of 1.6 mu m (TlBi)(0.9)Sr1.6Ba0.4Ca2Cu3Ag0.2Ox films indicate the full width at half maximum (FWHM) of only 0.92 degrees and 0.6 degrees , respectively, indicating a very high-quality film prepared by the ED proc ess. Transport measurements for the electrodeposited, thallium-oxide-based superconductor films show values above 10(6) A/cm(2) at 77 K in zero field. (C) 2000 Elsevier Science B.V. All rights reserved.