Condition optimization, reliability evaluation of SiO2-SiO2HF bonding and its application for UV detection micro flow cell

In order to apply SiO2-SiO2 bonding with hydrofluoric acid (KF bonding) for micro-electro-mechanical systems (MEMS) fabrication, the optimal bonding c onditions were examined under different temperature, HF concentration and b onding time. The necessary HF concentration and the necessary time for bond ing are reduced by elevating the bonding temperature. The time for bonding was reduced from 24 h at room temperature to 30 min at 80 degrees C, 60 min at 60 degrees C under the conditions of 0.5 wt.% HF concentration and 1.3 MPa applied pressure. The bonding time is comparable to that of anodic bond ing. Reliability of the HF bonding was confirmed by the results of temperat ure cyclic tests and thermal shock tests. A long term stability of the bond ed sample was also evaluated by helium (He) leak detection. The measured He leak rate was less than 2.0 X 10(-9) atm cm(3)/s which is much smaller tha n that calculated value through component materials of the sample. A novel quartz UV detection micro Row cell for chemical analysis having Si shade st ructure was fabricated by the HF bonding. The absorbance unit for UV absorp tion detection of the cell was improved remarkably. (C) 2000 Elsevier Scien ce S.A. All rights reserved.