Single-crystalline GaAs, AlGaAs, and InGaAs layers grown by metalorganic VPE on porous GaAs substrates

Citation
Yn. Buzynin et al., Single-crystalline GaAs, AlGaAs, and InGaAs layers grown by metalorganic VPE on porous GaAs substrates, TECH PHYS L, 26(4), 2000, pp. 298-301
Citations number
5
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
TECHNICAL PHYSICS LETTERS
ISSN journal
10637850 → ACNP
Volume
26
Issue
4
Year of publication
2000
Pages
298 - 301
Database
ISI
SICI code
1063-7850(200004)26:4<298:SGAAIL>2.0.ZU;2-0
Abstract
Conditions for the growth of single-crystalline GaAs, AlGaAs, and InGaAs la yers by metalorganic VPE were established and the corresponding semiconduct or films were obtained on porous GaAs substrates. Comparative data on the m orphology, structure, and electrical homogeneity of the epitaxial layers gr own on the porous and monolithic substrates are presented. It was found tha t passage to the porous substrates leads to changes in the film growth rate and morphology, the concentration of electrically active defects, and thei r distribution in depth of the epitaxial structures. (C) 2000 MAIK "Nauka/I nterperiodica".