Weak beam under convergent beam illumination

Citation
R. Schaublin et al., Weak beam under convergent beam illumination, ULTRAMICROS, 83(3-4), 2000, pp. 145-157
Citations number
36
Categorie Soggetti
Multidisciplinary,"Spectroscopy /Instrumentation/Analytical Sciences
Journal title
ULTRAMICROSCOPY
ISSN journal
03043991 → ACNP
Volume
83
Issue
3-4
Year of publication
2000
Pages
145 - 157
Database
ISI
SICI code
0304-3991(200006)83:3-4<145:WBUCBI>2.0.ZU;2-T
Abstract
The weak beam technique is now used widely for the determination of stackin g fault energies, in particular for intermetallic alloys, and the accuracy of the approach is critically dependent upon the reliability of the relatio nship between the image and the actual position of the dissociated dislocat ions. Examining as a model case a dislocation dissociated into two Shockley partial dislocations in Cu at 100 kV for orientations ranging through the g(3g) weak beam condition, image simulations are used to explore the accura cy to which the true spacing between the partial dislocations can be determ ined from the spacing measured on the image as a function of the dislocatio n character, the foil thickness, the dislocation depth in the foil, the dif fraction condition and the beam convergence. It appears that for image simu lations and for the given conditions a beam convergence of about 5 mrad all ows to greatly improve the accuracy, and that beam convergence must be take n into account quantitatively when deducing the true partial dislocation sp acing as it is the principal parameter controlling the precision in this ty pe of measurement. (C) 2000 Elsevier Science B.V. All rights reserved.