The beta-scission growth mechanism at the diamond (100)(2x1) surface is stu
died by a combination of nanoscale ab-initio LDA/GGA and semiempirical tigh
t-binding techniques to provide the necessary input into the mesoscale vari
able rime step Kinetic Monte Carlo (KMC) simulations of CVD diamond growth.
The reaction path of the beta-scission reaction is critically examined, an
d the activation barrier of the reverse etching of the methylene adsorbate
is deduced. We also considered the energetics of possible adsorbate configu
rations and showed that the removal of methylene (CH2) moieties from terrac
e and step edge sites is not appreciable. This 'preferential etching' of is
olated CH2 from the (100) surface by atomic hydrogen effectively creates a
barrier to (100) Layer nucleation. (C) 2000 Elsevier Science S.A. All right
s reserved.