Microstructural analysis of III-V nitrides grown on 6H-SiC by metal-organic vapour phase epitaxy (MOVPE)

Citation
H. Lahreche et al., Microstructural analysis of III-V nitrides grown on 6H-SiC by metal-organic vapour phase epitaxy (MOVPE), DIAM RELAT, 9(3-6), 2000, pp. 452-455
Citations number
13
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
DIAMOND AND RELATED MATERIALS
ISSN journal
09259635 → ACNP
Volume
9
Issue
3-6
Year of publication
2000
Pages
452 - 455
Database
ISI
SICI code
0925-9635(200004/05)9:3-6<452:MAOING>2.0.ZU;2-H
Abstract
We have studied the growth mechanisms of GaN and AlGaN layers with low alum inium incorporation (<7%) deposited by metal-organic vapour phase epitaxy ( MOVPE) on 6H-SiC. The direct growth of GaN leads to isolated islands. For A lGaN alloys, the growth can be either three-dimensional or two-dimensional depending on the proportion of aluminium in the vapour phase. Aluminium-ric h seeds, whose density depends on the aluminium incorporation in the alloy and on the 6H-SiC surface preparation, act as nucleation centres and enable one to obtain flat layers after lateral coalescence. (C) 2000 Elsevier Sci ence S.A. All rights reserved.