H. Lahreche et al., Microstructural analysis of III-V nitrides grown on 6H-SiC by metal-organic vapour phase epitaxy (MOVPE), DIAM RELAT, 9(3-6), 2000, pp. 452-455
We have studied the growth mechanisms of GaN and AlGaN layers with low alum
inium incorporation (<7%) deposited by metal-organic vapour phase epitaxy (
MOVPE) on 6H-SiC. The direct growth of GaN leads to isolated islands. For A
lGaN alloys, the growth can be either three-dimensional or two-dimensional
depending on the proportion of aluminium in the vapour phase. Aluminium-ric
h seeds, whose density depends on the aluminium incorporation in the alloy
and on the 6H-SiC surface preparation, act as nucleation centres and enable
one to obtain flat layers after lateral coalescence. (C) 2000 Elsevier Sci
ence S.A. All rights reserved.