The long term stability of InGaN based light emitting- and laser-diodes is
potentially compromised by phase separation and indium interdiffusion. Medi
um energy ion scattering has been used to investigate the diffusion of indi
um within In0.25Ga0.75N/GaN structures at 950 degrees C. Comparison of the
aligned and random ion scattering data for the as-deposited InGaN layer sho
w that ca. 15% of the indium atoms are interstitial. Annealing at 950 degre
es C causes decomposition of the InGaN layer into InN and a range of lower
indium content ternary phases. (C) 2000 Elsevier Science S.A. All rights re
served.