Indium segregation in MOCVD InGaN layers studied by medium energy ion scattering

Citation
Pr. Chalker et al., Indium segregation in MOCVD InGaN layers studied by medium energy ion scattering, DIAM RELAT, 9(3-6), 2000, pp. 520-523
Citations number
9
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
DIAMOND AND RELATED MATERIALS
ISSN journal
09259635 → ACNP
Volume
9
Issue
3-6
Year of publication
2000
Pages
520 - 523
Database
ISI
SICI code
0925-9635(200004/05)9:3-6<520:ISIMIL>2.0.ZU;2-Z
Abstract
The long term stability of InGaN based light emitting- and laser-diodes is potentially compromised by phase separation and indium interdiffusion. Medi um energy ion scattering has been used to investigate the diffusion of indi um within In0.25Ga0.75N/GaN structures at 950 degrees C. Comparison of the aligned and random ion scattering data for the as-deposited InGaN layer sho w that ca. 15% of the indium atoms are interstitial. Annealing at 950 degre es C causes decomposition of the InGaN layer into InN and a range of lower indium content ternary phases. (C) 2000 Elsevier Science S.A. All rights re served.