Low paramagnetic defect density hydrogenated amorphous carbon (a-C:H) films
grown by radio frequency driven plasma enhanced chemical vapour deposition
(rf-PECVD) system an characterised using ultraviolet/visible spectroscopy
and Rutherford backscattering spectroscopy (RBS). The changes in the optica
l band gap, Urbach tail width, and Tauc B-1 parameter as a function of nitr
ogen flow rate and ex situ annealing from 100 to 400 degrees C for 300 s ar
e examined. Particular attention is paid to changes in the film structure a
fter annealing at 100 degrees C, since an increase in the E-04 optical band
gap is observed as a function of nitrogen flow. This increase is shown to
be a result of the restructuring of the chemical bonds present, despite the
re being no change in the refractive index of the films, which suggests a d
ecrease in the defect band tails of the films. (C) 2000 Elsevier Science S.
A. All rights reserved.