Properties of silicon-carbon-cluster-assembled films

Citation
P. Keghelian et al., Properties of silicon-carbon-cluster-assembled films, EUR PHY J D, 9(1-4), 1999, pp. 639-642
Citations number
14
Categorie Soggetti
Physics
Journal title
EUROPEAN PHYSICAL JOURNAL D
ISSN journal
14346060 → ACNP
Volume
9
Issue
1-4
Year of publication
1999
Pages
639 - 642
Database
ISI
SICI code
1434-6060(199912)9:1-4<639:POSF>2.0.ZU;2-#
Abstract
We have investigated SiC films, obtained by the low-energy cluster beam dep osition (LECBD) technique, and using AFM Raman and XPS spectroscopies. We p roduce these films at room temperature and in an ultrahigh vacuum environme nt to protect them from the pollution. The inner morphology of the clusters is close to an amorphous-like structure. However, most of the theoretical models predict an sp(3) hyridization, in disagreement with our experimental results. We find that the films are composed mainly by free components for med by rich silicon, rich carbon, and rich SiC regions, respectively. In ou r case, the mean hybridization of the rich carbon region is mainly sp(n)-li ke with 2 < n < 3.