Mg. Beghi et al., ANALYSIS OF STRUCTURAL IMPERFECTIONS OF SILICON-ON-INSULATOR STRUCTURES, Materials science & engineering. B, Solid-state materials for advanced technology, 46(1-3), 1997, pp. 20-23
Silicon-on-insulator structures prepared using the separation by impla
nted oxygen technology are studied by means of Brillouin light scatter
ing. The deviation in the experimental wave velocity for modes guided
within the SiO2 buried layer is ascribed to the presence of silicon in
clusions dispersed in the oxide matrix. The presence of inclusions is
taken into account by means of an effective medium theory which allows
to determine the inclusion volume fraction and the anisotropy of thei
r orientation. (C) 1997 Elsevier Science S.A.