SOI-STRUCTURES PRODUCED BY THE SILICON DIRECT BONDING METHOD

Citation
Kl. Enisherlova et al., SOI-STRUCTURES PRODUCED BY THE SILICON DIRECT BONDING METHOD, Materials science & engineering. B, Solid-state materials for advanced technology, 46(1-3), 1997, pp. 33-37
Citations number
9
Categorie Soggetti
Material Science","Physics, Condensed Matter
ISSN journal
09215107
Volume
46
Issue
1-3
Year of publication
1997
Pages
33 - 37
Database
ISI
SICI code
0921-5107(1997)46:1-3<33:SPBTSD>2.0.ZU;2-T
Abstract
Complex investigations of silicon-on-insulator (SOI)-structures produc ed by silicon direct bonding have been carried out. The investigations have shown that the quality of the formed monolithic SOI-structures s trongly depends on the regimes of the low-temperature step. The optima l kinematics of the process of silicon surfaces contact at room temper ature has been determined. The measurements have shown that the surfac e states density at the Si-SiO2 interface and fixed charge in the oxid e for the SOI-structures are concordant with those of a thermal gate o xide. (C) 1997 Elsevier Science S.A.