Ni. Kuznetsov et al., ELECTRICAL CHARACTERISTICS OF GAN 6H-SIC N-P HETEROJUNCTIONS/, Materials science & engineering. B, Solid-state materials for advanced technology, 46(1-3), 1997, pp. 74-78
n-Type GaN layers of high crystalline quality have been grown on p-typ
e 6H-SiC substrates by HVPE. The electronic properties of the n-p hete
rojunctions indicate a typical diode behaviour. The turn-on voltage of
the forward I-TI characteristic is about 2 V while the reverse charac
teristic showing an abrupt breakdown at voltage close to 30 V. Using C
-V measurements, the density of interface traps has been estimated to
be 7 x 10(12) cm (-2). These interface traps limit the current transpo
rt in the p-6H-SiC/n-GaN heterojunction. (C) 1997 Published by Elsevie
r Science S.A.