CNX THIN-FILMS PREPARED BY LASER-CHEMICAL VAPOR-DEPOSITION

Amorphous CNx thin films with 0.7 less than or equal to x less than or equal to 1.1 were obtained by ArF excimer laser chemical vapor deposi tion from NH3 and CCl4 as precursors in the substrate temperature rang e of 200 to 400 degrees C. The slightly brownish films are optically t ransparent and electrically insulating. They are mechanically stable ( several mm free standing at about 100 nm thickness) and very smooth (0 .3 nm r.m.s. roughness). They are insoluble in organic solvents, in ly es and in acids except for concentrated sulfuric acid. They are heat r esistant up to 600 degrees C but decompose completely at 800 degrees C . (C) 1997 Elsevier Science S.A.